X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2005-05-17
2005-05-17
Ho, Allen C. (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
C378S070000, C378S086000, C378S088000, C378S089000
Reexamination Certificate
active
06895075
ABSTRACT:
Apparatus for inspection of a sample includes a radiation source and an array of detector elements arranged to receive radiation from the surface due to irradiation of an area of the surface by the radiation source. The array has a first operative configuration for resolving the received radiation along a first axis perpendicular to the surface, and a second operative configuration for resolving the received radiation along a second axis parallel to the surface. A signal processor processes the signal from the detector array in the two configurations so as to determine a reflectance of the surface as a function of elevation angle relative to the surface and a scattering profile of the surface as a function of azimuthal angle in a plane of the surface.
REFERENCES:
patent: 4725963 (1988-02-01), Taylor et al.
patent: 5151588 (1992-09-01), Kiri et al.
patent: 5574284 (1996-11-01), Farr
patent: 5619548 (1997-04-01), Koppel
patent: 5740226 (1998-04-01), Komiya et al.
patent: 5923720 (1999-07-01), Barton et al.
patent: 5949847 (1999-09-01), Terada et al.
patent: 6192103 (2001-02-01), Wormington et al.
patent: 6381303 (2002-04-01), Vu et al.
patent: 6389102 (2002-05-01), Mazor et al.
patent: 6453006 (2002-09-01), Koppel et al.
patent: 6507634 (2003-01-01), Koppel et al.
patent: 6512814 (2003-01-01), Yokhin et al.
patent: 6643354 (2003-11-01), Koppel et al.
patent: 6711232 (2004-03-01), Janik
patent: 6744950 (2004-06-01), Aleksoff
patent: 6771735 (2004-08-01), Janik et al.
patent: 20010028699 (2001-10-01), Iwasaki
patent: 20010043668 (2001-11-01), Hayashi et al.
patent: 20020097837 (2002-07-01), Fanton et al.
patent: 20020110218 (2002-08-01), Koppel et al.
patent: 20030157559 (2003-08-01), Omote et al.
patent: 20040052330 (2004-03-01), Koppel et al.
Chihab et al., “New Apparatus for Grazing X-Ray Reflectometry in the Angle-Resolved Dispersive Mode”, Journal of Applied Crystallography 22 (1989), p. 460.
XTF5011 Tube, Produced by Oxford Instruments of Scotts Valley, California. Jun. 1999.
Doubly-Bent Focusing Crystal Optic, Produced by XOS Inc., of Albany, New York. Jul. 2000.
Wiener et al., “Characterization of Titanium Nitride Layers by Grazing-Emission X-Ray Fluorescence Spectrometry”, in Applied Surface Science 125 (1998), p. 129.
Model S7032-0908N array, Produced by Hamamatsu, of Hamamatsu City, Japan. May 2000.
J. Spear, “Metrology for low-k materials”, Silknet Aliance, 2003.
J.R. Levine Parrill, et al, “GISAXS—Glancing Incidence Small Angle X-ray Scattering”, Journal de Physique IV 3 (Dec. 1993), pp. 411-417.
Jaklevic, et al., “High Rate X-Ray Fluorescence Analysis by Pulsed Excitation”, IEEE Transactions on Nuclear Science NS-19:3 (1972), pp. 392-395.
Jaklevic, et al., “Small X-Ray Tubes for Energy Dispersive Analysis Using Semiconductor Spectrometers”, Advances in X-Ray Analysis 15 (1972), pp. 266-275.
Jaklevic, et al., “Energy Dispersive X-Ray Fluorescence Spectrometry Using Pulsed X-Ray Excitation”, Advances in X-Ray Analysis 19 (1976).
Wormington, Characterization of Pore Size Distribution in Low k Dielectrics Using X-ray Reflectivity, presented at the Sematech Gate Stack Engineering Workshop (Austin, Texas, May 2, 2002).
Ito, “X-ray Scattering Method for Determining Pore-Size Distribution in Low-k Thin Films”, Presented at the International Sematech Ultra-Low-k Workshop (San Francisco, CA, Jun. 6-7, 2002).
N. Wu, et al, “Substepping and its Application to HST Imaging”, Jul. 28, 2003.
Dikopoltsev Alexander
Gvirtzman Amos
Rafaeli Tzachi
Yokhin Boris
Ho Allen C.
Jordan Valley Applied Radiation Ltd.
Weingarten Schurgin, Gagnebin & Lebovici LLP
LandOfFree
X-ray reflectometry with small-angle scattering measurement does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with X-ray reflectometry with small-angle scattering measurement, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and X-ray reflectometry with small-angle scattering measurement will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3373275