X-ray mask structure for reducing the distortion of a mask

Details X-ray mask structure for reducing the distortion of a mask X-ray mask structure for reducing the distortion of a mask

1997-02-04

1998-08-18

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 34, G21K 508

Patent

active

057968047

ABSTRACT:
A X-ray mask structure which reduces the distortion of the membrane, the X-ray mask structure including, a mask substrate having an opening in the central part thereof, a membrane formed on the mask substrate, the membrane having the chip site on which absorbers are arranged according to a desired pattern of a semiconductor device, and a support ring for supporting the mask substrate, which is defined by a plurality of fragments.

REFERENCES:
patent: 5224139 (1993-06-01), Korenaga et al.
patent: 5356686 (1994-10-01), Fujioka et al.
patent: 5485495 (1996-01-01), Miyachi et al.

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