X-ray mask and its fabrication method

Details X-ray mask and its fabrication method X-ray mask and its fabrication method

1997-08-29

1999-10-19

Church, Craig E.

X-ray or gamma ray systems or devices

Specific application

Lithography

378210, G21K 500

Patent

active

059701145

ABSTRACT:
Disclosed are X-ray masks exhibiting improved stability and reliability of the X-ray masks, and methods of making these masks. The X-ray masks include a membrane, an X-ray absorber pattern on the membrane, which is formed on a top side of a substrate, or an oxide layer between the membrane and the X-ray absorber pattern.

REFERENCES:
patent: 4152601 (1979-05-01), Kadota et al.
patent: 4515876 (1985-05-01), Yoshihara et al.

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