X-ray mask and its fabrication method

Details X-ray mask and its fabrication method X-ray mask and its fabrication method

1995-04-24

1996-03-05

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

378 34, 378 35, G03F 900

Patent

active

054966671

ABSTRACT:
In order to provide an X-ray absorber low in the internal stress and suitable for forming a high accurate pattern and its fabrication method, an X-ray absorber for an X-ray mask is intended to contain tungsten and nitrogen, or tungsten, titanium and nitrogen, and to have an amorphous structure.

REFERENCES:
patent: 4865952 (1989-09-01), Yoshioka et al.
patent: 4873162 (1989-10-01), Yoshioka et al.
patent: 5132186 (1992-07-01), Takeuchi et al.
patent: 5188706 (1993-02-01), Hori et al.
patent: 5196283 (1993-03-01), Ikeda et al.

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