X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1997-08-21
1999-03-02
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Lithography
378210, G21K 500
Patent
active
058781056
ABSTRACT:
An X-ray mask, which is used in transferring an image formed on a patterned mask to a wafer by exposing the mask with an X-ray, comprises a supplementary substrate attached to the back side of a support ring for preventing a thermal distortion of the X-ray mask due to the difference of thermal coefficient of expansion between a mask substrate and the support ring and for improving the resistance to the external mechanical stress, the supplementary substrate being made of the same material as the mask substrate and obtained through the same processing steps as the mask substrate.
REFERENCES:
patent: 5199055 (1993-03-01), Noguchi et al.
Tsutomu Shoki, et al., Effect of Anodic Bonding Temperature on Mechanical Distortion of SiC X-Ray Mask Substrate, Jpn. J. Appl. Phys., Vol. 31, Dec. 1992, pp. 4215-4220.
Choi Sang Soo
Jeon Young Jin
Jung Jin Man
Kim Bo Woo
Yoo Hyung Joun
Church Craig E.
Electronics and Telecommunications Research Institute
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