X-ray lithography masking

Details X-ray lithography masking X-ray lithography masking

1996-12-20

1998-09-15

Church, Craig E.

X-ray or gamma ray systems or devices

Specific application

Lithography

378210, G21K 500

Patent

active

058091033

ABSTRACT:
X-ray masking apparatus includes a frame having a supporting rim surrounding an x-ray transparent region, a thin membrane of hard inorganic x-ray transparent material attached at its periphery to the supporting rim covering the x-ray transparent region and a layer of x-ray opaque material on the thin membrane inside the x-ray transparent region arranged in a pattern to selectively transmit x-ray energy entering the x-ray transparent region through the membrane to a predetermined image plane separated from the layer by the thin membrane. A method of making the masking apparatus includes depositing back and front layers of hard inorganic x-ray transparent material on front and back surfaces of a substrate, depositing back and front layers of reinforcing material on the back and front layers, respectively, of the hard inorganic x-ray transparent material, removing the material including at least a portion of the substrate and the back layers of an inside region adjacent to the front layer of hard inorganic x-ray transparent material, removing a portion of the front layer of reinforcing material opposite the inside region to expose the surface of the front layer of hard inorganic x-ray transparent material separated from the inside region by the latter front layer, and depositing a layer of x-ray opaque material on the surface of the latter front layer adjacent to the inside region.

REFERENCES:
patent: 3743842 (1973-07-01), Smith et al.
patent: 4170512 (1979-10-01), Flanders et al.
patent: 4254174 (1981-03-01), Flanders et al.
patent: 4698285 (1987-10-01), Ehrfeld et al.
patent: 4735877 (1988-04-01), Kato et al.
patent: 5111491 (1992-05-01), Imai et al.

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