X-Ray lithography apparatus and method of use

Details X-Ray lithography apparatus and method of use X-Ray lithography apparatus and method of use

1982-05-24

1984-06-05

Willis, Davis L.

X-ray or gamma ray systems or devices

Specific application

Lithography

430967, B05D 306

Patent

active

044532628

ABSTRACT:
In order to obtain shorter exposure time and to obtain a longer life in x-ray lithography apparatus, an x-ray target made of tungsten is utilized and the apparatus operated to generate the tungsten M-line, this line being at a wavelength which will be absorbed by the resist normally used in lithography. To develop the resist, which was initially designed for use in an electron beam lithography, a developing method is used in which an initial short development with a high concentration is first carried out followed by a longer, full development with a concentration which is approximately the lowest at which complete development will take place.

REFERENCES:
patent: 4342917 (1982-08-01), Buckley

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