X-Ray Lithography apparatus

Details X-Ray Lithography apparatus X-Ray Lithography apparatus

1984-04-06

1986-02-04

Smith, Alfred E.

X-ray or gamma ray systems or devices

Specific application

Lithography

378134, 378137, G21K 500

Patent

active

045690685

ABSTRACT:
An X-ray lithography apparatus wherein a linear X-ray source is formed by line scanning a target with electron lines, a band-slit having slits which extend in the direction similar to the longitudinal direction of said linear X-ray source and a solar-slit having plural slits in the direction perpendicular to said band-slit are interposed between the X-ray source and a wafer in order to irradiate only the component which is substantially perpendicular to the surface of the wafer out of the X-ray generated from the linear source, and said wafer is made to move continuously or stepwise in respect of a rectangular region which is highly collimated in order to conduct X-ray transfer against a predetermined region.

REFERENCES:
patent: 3947687 (1976-03-01), Fenstermacher
patent: 4194123 (1980-03-01), Wittry
Cullity, B. D., Elements of X-ray Diffraction Second Ed., Addison Wesley, Reading Mass., 1978, p. 198.

Affiliated with

Also associated with

Rating

X-Ray Lithography apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with X-Ray Lithography apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and X-Ray Lithography apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2345371