X-Ray lithographic system

Details X-Ray lithographic system X-Ray lithographic system

1983-10-13

1985-04-30

Smith, Alfred E.

X-ray or gamma ray systems or devices

Specific application

Lithography

378210, G21K 500

Patent

active

045148570

ABSTRACT:
While a convex mirror is being rotated or rotatingly vibrated about a rotational axis which is parallel to the center axis of the convex mirror and which is eccentric to the convex mirror, a synchrotron radiation flux is caused to be incident on the convex mirror, and a radiation sensitive resist film is irradiated with the reflected radiation flux through a mask.
Thus, an area of uniform irradiation can be increased remarkably as compared with that in a prior art, and the invention is well suited to the irradiation of a semiconductor wafer having a large area.

REFERENCES:
patent: 4242588 (1980-12-01), Silk et al.

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