X-ray lithographic mask blank with reinforcement

Details X-ray lithographic mask blank with reinforcement X-ray lithographic mask blank with reinforcement

1992-07-06

1993-03-30

Church, Craig E.

X-ray or gamma ray systems or devices

Specific application

Lithography

378210, G21K 500

Patent

active

051990555

ABSTRACT:
Proposed is a high-precision X-ray lithographic mask blank with reinforcement free from warping or distortion. The mask blank is an integral body comprising: (a) a frame made from a silicon wafer; (b) a membrane of an X-ray permeable material such as silicon carbide adhering to and supported by one surface of the frame; and (c) a reinforcing member made from a single crystal of silicon adhesively bonded to the other surface of the frame with (d) a layer of silicon oxide intervening between the frame and the reinforcing member. The mask blank can be prepared in a process of first forming a layer of silicon oxide on the surface of the silicon wafer and/or reinforcing member prior to deposition of the X-ray permeable film on the silicon wafer and heating them together at a temperature of 800.degree. C. or lower while they are in direct contact with each other with the silicon oxide layer intervening therebetween.

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