X-ray or gamma ray systems or devices – Source
Reexamination Certificate
2006-12-05
2006-12-05
Glick, Edward J. (Department: 2882)
X-ray or gamma ray systems or devices
Source
Reexamination Certificate
active
07145987
ABSTRACT:
Devices are disclosed for generating X-rays, especially in a vacuum chamber from plasma formed by irradiating a target material with laser light, that provide convenient removal from the vacuum chamber of high-frequency-maintenance components without disturbing other components. In one configuration denoted a liquid-jet-type of X-ray generator, a nozzle (for spraying target material) and a mirror are situated in a vacuum chamber. The nozzle has a higher maintenance frequency than the mirror. A flange member is provided on an outer wall of the vacuum chamber to cover an opening in the wall. The nozzle is connected to a conduit having a base mounted to the flange member. The nozzle is removable for maintenance by detaching the flange member and withdrawing the nozzle through the opening. Thus, the highest-frequency-maintenance component, the nozzle, is removed without moving or removing any other component in the chamber, such as the mirror.
REFERENCES:
patent: 5170418 (1992-12-01), Ebinuma
patent: 6194733 (2001-02-01), Haas et al.
patent: 6341006 (2002-01-01), Murayama et al.
patent: 6507641 (2003-01-01), Kondo et al.
patent: 2002/0001363 (2002-01-01), Kondo
patent: 2002/0030799 (2002-03-01), Iwasaki et al.
patent: 2002/0041368 (2002-04-01), Kazuya et al.
patent: 2000047000 (2000-02-01), None
patent: 2001110709 (2001-04-01), None
patent: 2002-252162 (2002-09-01), None
Glick Edward J.
Kao Chih-Cheng Glen
Klarquist & Sparkman, LLP
Nikon Corporation
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