Photocopying – Projection printing and copying cameras – Illumination systems or details
Reexamination Certificate
2006-12-05
2006-12-05
Kim, Peter B. (Department: 2851)
Photocopying
Projection printing and copying cameras
Illumination systems or details
C355S053000, C355S055000, C355S063000, C355S067000
Reexamination Certificate
active
07145641
ABSTRACT:
A lithographic apparatus is disclosed. The apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The projection system includes an optical element that has a beam entry area and an optical element that has a beam exit area through each of which the patterned beam passes. The apparatus further includes a nucleated surface that is associated with the projection system on which a plurality of nucleation sites are provided. The surface is disposed away from at least one of the beam entry area and the beam exit area.
REFERENCES:
patent: 5696623 (1997-12-01), Fujie et al.
patent: 0 706 042 (1996-04-01), None
patent: 0 874 283 (1998-10-01), None
patent: 0 874 283 (2000-01-01), None
patent: 1 037 036 (2000-09-01), None
patent: 1 526 550 (2005-04-01), None
patent: 2005-123305 (2005-05-01), None
patent: WO 2005/111722 (2005-11-01), None
International Search Report issued for PCT Application PCT/NL2004/000927 on Dec. 19, 2005.
Dirksen Peter
Kroon Mark
Kurt Ralph
Owen Cassandra May
Van Beek Michael Cornelis
ASML Netherlands B.V.
Kim Peter B.
Pillsbury Winthrop Shaw & Pittman LLP
LandOfFree
Lithographic apparatus, device manufacturing method, and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Lithographic apparatus, device manufacturing method, and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic apparatus, device manufacturing method, and... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3669535