X-ray exposure system

Details X-ray exposure system X-ray exposure system

1987-01-20

1989-02-07

Church, Craig E.

X-ray or gamma ray systems or devices

Specific application

Lithography

2504922, G03F 900

Patent

active

048037125

ABSTRACT:
An X-ray exposure system includes a frame set on the floor; an X-ray source fixedly provided in the central portion of the upper part of the frame; a mask-wafer alignment means comprising a wafer at a fixed distance from a mask, an X-Y table mounted with the wafer holder, a mask holder for holding the mask, and an alignment detecting means for detecting the alignment of the alignment pattern of the mask and that of the wafer; vibration isolators for supporting the mask-wafer alignment means so that vibrations do not propagate to the mask-wafer alignment means; detecting means for detecting the position of the mask-wafer alignment means with respect to three-dimensional directions relative to the X-ray source; an arithmetic means for calculating an exposure error of a dislocation of a mask pattern exposure on the wafer, on the basis of position data obtained by the detecting means; and correcting means for correcting the exposure error calculated by the arithmetic means.

REFERENCES:
patent: 4403336 (1983-09-01), Taniguchi et al.
patent: 4514858 (1985-04-01), Novak
patent: 4644576 (1987-02-01), Kuyel

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