4. Supports
  5. Supporting base
  6. Including attachment or holder for article

Motoya Taniguchi

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Exposure process and system

X-ray or gamma ray systems or devices – Specific application – Lithography
Patent

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Information detecting system of scanning type

Optical waveguides – Integrated optical circuit
Patent

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Light-exposure apparatus

Photocopying – Projection printing and copying cameras – Distortion introducing or rectifying
Patent

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Precision parallel translation system

Supports – Supporting base – Including attachment or holder for article
Patent

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X-Ray exposure apparatus

X-ray or gamma ray systems or devices – Specific application – Lithography
Patent

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Profile ID: LFUS-PAI-P-231752

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