X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1985-10-17
1989-04-25
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Lithography
141 66, 2505031, 250432R, G21K 500
Patent
active
048254533
ABSTRACT:
Disclosed is an X-ray exposure apparatus having a low attenuation chamber supplied with a gas absorbing little X-rays, the low attenuation chamber being interposed between an X-ray source and a mask so that X-rays transmitted through the low attenuation chamber are irradiated on the mask so as to transfer a mask pattern onto a resist on a wafer, the apparatus comprising detecting means for detecting the gas or components mixed in the gas in the low attenuation chamber, control means for controlling a quantity of supply of the gas into the low attenuation chamber in accordance with an output signal of the detecting means, and/or adjusting means for adjusting a quantity of exposure of said X-rays irradiated on the mask in accordance with an output signal of the detecting means.
REFERENCES:
patent: 2307754 (1943-01-01), Beckwith
patent: 2804102 (1957-08-01), Cooksley et al.
patent: 4119855 (1978-10-01), Bernacki
patent: 4403336 (1983-09-01), Taniguchi et al.
patent: 4436998 (1984-03-01), Tallon
patent: 4516254 (1985-05-01), Komeyama et al.
patent: 4648106 (1987-03-01), Novak
Patent Abstracts of Japan vol. 7 No. 166 (E-188) [1311] Jul. 21, 1983 pertaining to JP-A-No. 58-73 116.
"High Speed Replication of Submicron Features . . . " by Maydan et al. Transactions on Electronic Devices vol. 22 #7 Jul. 1975.
Ikeda Minoru
Inagaki Akira
Kembo Yukio
Komeyama Yoshihiro
Church Craig E.
Freeman John C.
Hitachi , Ltd.
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