Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Layout generation
Reexamination Certificate
2011-04-12
2011-04-12
Levin, Naum (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Design of semiconductor mask or reticle
Layout generation
C341S063000, C341S067000, C382S246000
Reexamination Certificate
active
07926007
ABSTRACT:
A writing apparatus includes a unit storing writing data, a unit which acquires pattern information on patterns defined in the data, a unit which generates a table where each pattern information corresponds to a number of times each pattern information is used, for each predetermined region, a unit which generates a Huffman tree, based on the table, a unit which generates another table where each pattern information corresponds to a variable length binary code generated by encoding each pattern information such that the larger the number of times each pattern information is used, the smaller a value of the code, based on the tree, a unit which produces converted data, which is defined by the data, in the region into a predetermined format using the code, based on the other table, and a unit which writes the patterns defined, onto a workpiece, based on the converted data in the region.
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patent: 6865668 (2005-03-01), Benes et al.
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patent: 2007-128933 (2007-05-01), None
Office Action issued Dec. 20, 2010 in corresponding Korean Patent Application No. 10-2009-8343 (with English translation).
Levin Naum
NuFlare Technology, Inc.
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
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