Workpiece having alignment marks for positioning a pattern at a

Details Workpiece having alignment marks for positioning a pattern at a Workpiece having alignment marks for positioning a pattern at a

1992-12-22

1995-04-18

Turner, Samuel A.

Optics: measuring and testing

By polarized light examination

With birefringent element

356401, 356356, G01B 902

Patent

active

054083206

ABSTRACT:
A semiconductor wafer includes a top surface on which a semiconductor circuit pattern is to be fabricated, and a bottom surface on which alignment marks for positioning the semiconductor circuit pattern are arranged. The alignment marks are arranged at a predetermined pitch and in an arrangement that is not unique to the pattern formed on the top surface.

REFERENCES:
patent: 4952060 (1990-08-01), Ina et al.
patent: 5127733 (1992-07-01), Allgauga
patent: 5200798 (1993-04-01), Katagiri et al.

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