Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2007-02-20
2009-12-29
Smith, Bradley K (Department: 2894)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C257S774000, C257S778000, C257S737000, C257S623000, C257SE23037
Reexamination Certificate
active
07638418
ABSTRACT:
A wiring substrate of a semiconductor component includes: an underside with a wiring structure; a top side with cutouts; a rubber-elastic material arranged in the cutouts; and external contact pads arranged on the rubber-elastic material and configured to be coupled to external contacts. A method for producing a wiring substrate of this type, involves pressing the rubber-elastic material pads into a precursor of a polymer plastic during the production process.
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Ray Fillion, Laura Meyer, Kevin Durocher, Slawomir Rubinsztajn, David Shaddock, “Stress Free Area Array Structures for Flip Chips and Chip Scale Devices,” 14th European Microelectronics and Packaging Conference & Exhibition Friedrichshafen, Germany, Jun. 23-25, 2003, GE Global Research Center, Niskayuna, NY.
Bauer Michael
Steiner Rainer
Woerner Holger
Edell Shapiro & Finnan LLC
Infineon - Technologies AG
Karimy Mohammad T
Smith Bradley K
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