Optics: measuring and testing – By configuration comparison – With photosensitive film or plate
Patent
1997-02-06
1998-05-05
Font, Frank G.
Optics: measuring and testing
By configuration comparison
With photosensitive film or plate
25055924, G01B 1100
Patent
active
057483205
ABSTRACT:
An apparatus for measuring the line widths of a wiring pattern obtained by etching a metal foil includes a first illumination means for illuminating the wiring pattern from one side with a light beam having a first wavelength, a second illumination means for illuminating the wiring pattern from the other side with a light beam having a second wavelength which is different from the first wavelength, and a measuring means for obtaining information of a line width by the light beam having the first wavelength and a line width by the light beam having the second wavelength, on the basis of the light beams having the first and second wavelengths which advance at the same time point from the wiring pattern simultaneously illuminated by the first and second illumination means to said the other side. The wiring pattern may be repetitive patterns on a moving tape carrier. In that case, the first and second illumination means output the light beams having the first and second wavelengths as flashes, respectively, every time each repetitive pattern reaches a predetermined measurement position.
REFERENCES:
patent: 4744662 (1988-05-01), Suto et al.
patent: 4908656 (1990-03-01), Suwa et al.
patent: 5048966 (1991-09-01), Schram
patent: 5621218 (1997-04-01), Tanaka
Font Frank G.
Mitsui Mining & Smelting Co. Ltd.
Smith Zandra V.
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