Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1986-12-09
1987-12-15
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430320, 430323, 430324, 156645, 1566591, 119 3, G03F 716
Patent
active
047133155
ABSTRACT:
A method of etching a plurality of identifying characters into a wire tag for macro-organisms is disclosed. The method includes the steps of coating the tag with photoresist, exposing a defined portion of the coated tag to light, the defined portion corresponding to the characters, removing a portion of the photoresist, with that removed portion also corresponding to the characters, and etching the uncoated portion of the tag. Thus, a pattern will be etched into the tag which corresponds to the characters. This provides a means for rapidly, inexpensively, and indelibly marking wire tags in a manner which is superior to the methods proposed in the prior art.
REFERENCES:
patent: 2121787 (1938-06-01), Dahlgren
patent: 3313301 (1967-04-01), Jefferts et al.
patent: 3369525 (1968-02-01), Debrotnic et al.
patent: 3536545 (1970-10-01), Traynor et al.
patent: 3545405 (1970-12-01), Jefferts
patent: 3820545 (1974-06-01), Jefferts
patent: 4056395 (1977-11-01), Sato et al.
patent: 4233964 (1980-11-01), Jefferts et al.
patent: 4293624 (1981-10-01), Buckley
patent: 4377627 (1983-03-01), Vinton
patent: 4522862 (1985-06-01), Bayer et al.
Kittle John E.
Owens Terry J.
LandOfFree
Wire tag etching system does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Wire tag etching system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Wire tag etching system will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1219862