Wet process for developing styrene polymer resists for submicron

Details Wet process for developing styrene polymer resists for submicron Wet process for developing styrene polymer resists for submicron

1983-05-05

1985-08-13

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430331, 430270, G03C 516

Patent

active

045350540

ABSTRACT:
The invention is directed to a process for preparation of a negative resist configuration on a siliceous substrate.
A negative resist polymer is bonded to the siliceous substrate using an intermediary interlayer of silane between the substrate and the resist polymer. The silane is applied to the siliceous substrate and the silane-coated surface is heated to accomplish bonding; the resist polymer is then applied as an overlay on the silane-coated surface and the resist polymer surface is irradiated to form an image therein and simultaneously to bond the resist polymer image to the silane-coated surface.
The resist image is then developed using a developer solvent to remove resist polymer which was not irradiated, and the developer solvent is followed by a rinse solvent which, in one aspect, substantially eliminates any snaky lines or edges on the developed resist image, or in another aspect, by utilizing multiple rinses to accomplish the same and to also remove substantially all of the residual developer solvent trapped within the developed resist image, thus reducing swelling and returning the initial resist to about the same dimensions as the image prior to development.

REFERENCES:
patent: 3984582 (1976-10-01), Feder et al.
patent: 4286049 (1981-08-01), Imamura et al.
J. Bandrup and E. H. Immergut (eds), Polymer Handbook (2nd Ed.), (John E. Wiley & Sons, Inc.), 1975, pp. IV-241 through IV-242, IV-248, IV-303 through IV-304.
Imamura, Saburo, "Chloromethylated Polystyrene as a Dry Etching-Resistant Negative Resist for Submicron Technology", Journal of the Electrochemical Society: Solid-State Science and Technology, vol. 126, No. 9, 1979, pp. 1628-1630.
Robert G. Braultand, Leroy J. Miller, Polymer Engineering and Science, 1980, vol. 20, No. 16, pp. 1064-1068.
H. S. Choong and F. J. Kahn, Journal of Vacuum Science and Technology, vol. 19, No. 4, 1981, pp. 1121-1126.
E. D. Feit et al., Journal of Vacuum Science and Technology, vol. 15, No. 3, 1978, pp. 944-947.
Y. Sakakibara et al., IEEE Transactions on Electron Devices, vol. ED-28, No. 11, Nov. 1981, pp. 1279-1284.
Martha Windholz et al., (ed), The Merck Index: An Encyclopedia of Chemicals and Drugs, (9th Ed.), 1976, (Merck & Co., Inc.), p. 3677, entry 3678 and 3679.

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