Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1997-07-31
1998-11-17
Chapman, Mark
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
4302821, 4302861, 430302, G03C 1725
Patent
active
058374213
ABSTRACT:
A photosensitive resin composition is provided which is excellent in water developability, impact resilience, resin plate strength after exposure, breaking extension, and resin-plate transparency. The composition comprises:
REFERENCES:
patent: 4275142 (1981-06-01), Hosaka et al.
patent: 4369246 (1983-01-01), Chen et al.
patent: 5175076 (1992-12-01), Ishikawa et al.
patent: 5238783 (1993-08-01), Taniguchi et al.
patent: 5348844 (1994-09-01), Garmong
Kakiuchi Tadahiro
Kanda Kazunori
Koshimura Katsuo
Muramoto Hisaichi
Nishioka Takashi
Chapman Mark
Japan Synthetic Rubber Co. Ltd.
Nippon Paint Co. Ltd.
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