Water based photoresist

Details Water based photoresist Water based photoresist

1977-09-28

1980-03-25

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430281, 430289, G03C 500, G03C 1495, G03C 166

Patent

active

041949129

ABSTRACT:
A positive-acting water-based photoresist comprising a polyethylene imine, a dichromate sensitizer and the balance water.

REFERENCES:
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patent: 3154479 (1964-10-01), Onishi et al.
patent: 3205156 (1965-09-01), Atarashi
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patent: 3651170 (1972-03-01), Silver
patent: 3759711 (1973-09-01), Rauner et al.
patent: 3778270 (1973-12-01), Roos
Datta, P. et al., A Study of Photochemical Reactions in a Dichromated Photoresist, (Paper Submitted at Int. Symposium on Advances in Photopolymer Systems-11/1978), pp. 25-28.
Hopkins et al., "Gen. Chem. for Colleges," D. C. Heath & Co., 1956, pp. 609-610.
Kirk-Othmar, "Encyclopedia of Chem. Tech.," vol. 17, 2nd Ed., pp. 406-407.
Kosar, J., "Light-Sensitive Systems," Wiley & Sons, 1965, pp. 51-54 and 67-71.
Saunders, T. F., "IBM Tech. Discl. Bulletin," vol. 10, No. 1, 6/1967, p. 64.

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