Wafer table and exposure apparatus with the same

Details Wafer table and exposure apparatus with the same Wafer table and exposure apparatus with the same

1992-01-17

1993-07-27

Anderson, Bruce C.

Radiant energy

Inspection of solids or liquids by charged particles

Analyte supports

25044011, 25044211, G01N 2100, G01N 2300, G21K 510

Patent

active

052312917

ABSTRACT:
A wafer table includes a wafer holding surface for holding a wafer by attraction; a flow passageway through which a temperature adjusting medium flows to remove any heat in the wafer table; a temperature measuring system for measuring the temperature of the wafer held by the wafer holding surface; a temperature adjusting system disposed between the wafer holding surface and the flow passageway; a temperature setting system for setting a temperature related to the wafer held by the wafer holding surface; a flow rate controlling system for controlling the flow rate of the temperature adjusting medium to be circulated through the flow passageway; and a temperature controlling system for controlling the operation of the temperature adjusting system related to heat, on the basis of a value set by the temperature setting system and a value measured by the temperature measuring system.

REFERENCES:
patent: 4432635 (1984-02-01), Mayer
patent: 4453080 (1884-06-01), Berkowitz
patent: 4503335 (1985-03-01), Takahashi
patent: 4663944 (1987-05-01), Bernius et al.
patent: 4749868 (1988-06-01), Hatanaka et al.
patent: 4879467 (1989-11-01), Muller et al.
patent: 4950901 (1990-08-01), Jones et al.
patent: 4987933 (1991-01-01), Mack
patent: 5063582 (1991-11-01), Mori et al.
patent: 5093579 (1992-03-01), Amemiya et al.

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