Wafer out-of-pocket detection tool

Metal working – Barrier layer or semiconductor device making

Patent

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Details

H01L 2100, H01L 2164

Patent

active

060995963

ABSTRACT:
An apparatus for monitoring the inclination of a wafer residing within a pocket of a semiconductor processing chamber susceptor. The apparatus of the present invention includes a laser beam source that is positioned to direct a laser beam onto the top surface of a wafer that has been positioned within a susceptor pocket. A laser receiver is positioned to detect the laser beam after it has been reflected off the surface of the wafer. The laser receiver emits an output signal to a visual or audible indicator that indicates whether or not the wafer is properly positioned within the pocket of the susceptor.

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