Wafer notch dimension measuring apparatus

Details Wafer notch dimension measuring apparatus Wafer notch dimension measuring apparatus

1996-07-01

1997-11-04

Hantis, K.

Optics: measuring and testing

By alignment in lateral direction

With light detector

25055929, 250548, G01B 1100

Patent

active

056845995

ABSTRACT:
An apparatus capable of concurrently measuring the depth and angle of a notch in the peripheral edge of a wafer includes: a unit for rotating the wafer; a wafer edge detector, including a light-emitting unit and a photo-detecting unit arranged to read the shape of the peripheral edge of the wafer, for outputting a wafer edge detecting signal corresponding to the shape of the peripheral edge of the wafer; a wafer rotational angular position detector for detecting the rotational angular position of the wafer being rotated and outputting a wafer rotational angular position detecting signal; and an arithmetical unit for computing the dimensions of the notch from the wafer edge detecting signal and the wafer rotational angular position detecting signal.

REFERENCES:
patent: 4097158 (1978-06-01), Dehait
patent: 4639604 (1987-01-01), Murakami et al.
patent: 4907035 (1990-03-01), Galburt et al.
patent: 5438209 (1995-08-01), Yamamoto et al.

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