Wafer holder for thermal processing apparatus

Details Wafer holder for thermal processing apparatus Wafer holder for thermal processing apparatus

1996-07-31

1999-01-26

Bowers, Jr., Charles L.

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

By reaction with substrate

438776, 438778, 438788, 438792, 118724, 118728, H01L 2131

Patent

active

058638431

ABSTRACT:
A wafer holder for maintaining a semiconductor wafer at a constant temperature during film deposition is disclosed. The wafer holder is configured to have one or more quartz arms. Affixed to each arm is at least one quartz support, whose top end is adapted for holding the semiconductor wafer. The top end of each support is tapered to have a diameter smaller than that of the quartz support and is optionally tapered to a point. A thermal mass element is optionally supported on the arms of the wafer holder, to keep uniform, the temperature at the perimeter of the wafer with respect to the rest of the semiconductor wafer during a material layer deposition. Also, a quartz backstop is optionally attached to each support arm to keep the semiconductor wafer positioned on top of the quartz supports when the wafer holder is rotated.

REFERENCES:
patent: 500113 (1893-12-01), Wang et al.
patent: 4872947 (1989-10-01), Wang et al.
patent: 5060354 (1991-10-01), Chizinsky
patent: 5343938 (1994-09-01), Schmidit
patent: 5520742 (1996-05-01), Ohkase
patent: 5580388 (1996-12-01), Moore

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