Wafer fixing unit for focused ion beam apparatus

Details Wafer fixing unit for focused ion beam apparatus Wafer fixing unit for focused ion beam apparatus

1998-02-09

1999-10-19

Anderson, Bruce C.

Radiant energy

Inspection of solids or liquids by charged particles

Analyte supports

25049221, H01J 3720, H01J 37317

Patent

active

059693649

ABSTRACT:
A wafer fixing unit of a FIB (Focused Ion Beam) apparatus, for maintaining the flat zone of a wafer in accurate horizontal alignment, includes a fixed frame in a horizontal plane, having a pair of side plates and a forward plate. A first member is composed of a flat rectangular plate in the horizontal plane having a rectangular depression in a forward section, movably disposed between the pair of side plates and rearward of the forward plate. A second member is defined by a T-shape, arranged substantially parallel and above the horizontal plane wherein a narrow end of the T-shape is connected to the first member and the narrow end fits in the rectangular depression. The second member is movably disposed above the forward plate and has a plurality of projecting parts disposed substantially perpendicular to the horizontal plane for contacting and securing a wafer. A pair of springs connect the first member to the forward plate, to allow movement of the first member to form a rest position and a wafer securing position.

REFERENCES:
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patent: 5040484 (1991-08-01), Mears et al.
patent: 5142154 (1992-08-01), Komagata
patent: 5247181 (1993-09-01), Oonuki et al.

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