Wafer edge wheel with drying function

Drying and gas or vapor contact with solids – Process – With nondrying treating of material

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

07089687

ABSTRACT:
An edge wheel for supporting and rotating a disk-shaped substrate includes a wheel body having a peripheral groove configured to support an edge of a substrate and at least one radial channel extending into said wheel body from said peripheral groove. An edge wheel dryer and a method for processing a disk-shaped substrate are also described.

REFERENCES:
patent: 4968375 (1990-11-01), Sato et al.
patent: 5084134 (1992-01-01), Mattiussi et al.
patent: 5620525 (1997-04-01), van de Ven et al.
patent: 5724748 (1998-03-01), Brooks et al.
patent: 5868857 (1999-02-01), Moinpour et al.
patent: 5967882 (1999-10-01), Duescher
patent: 6012192 (2000-01-01), Sawada et al.
patent: 6672341 (2004-01-01), Bartholomew et al.
patent: 2005/0132953 (2005-06-01), Davis et al.
patent: 2006/0000494 (2006-01-01), Garcia et al.
U.S. Appl. No. 10/745,219, filed Dec. 22, 2003, Davis et al.
U.S. Appl. No. 10/882,934, filed Jun. 30, 2004, Garcia et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Wafer edge wheel with drying function does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Wafer edge wheel with drying function, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Wafer edge wheel with drying function will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3677338

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.