Wafer edge cleaning

Details Wafer edge cleaning Wafer edge cleaning

2011-03-08

2011-03-08

Chin, Randall (Department: 3723)

Brushing, scrubbing, and general cleaning

Machines

Brushing

C015S088200, C015S088300, C015S102000, C414S936000, C134S006000

Reexamination Certificate

active

07900311

ABSTRACT:
In a first aspect, an apparatus for cleaning a thin disk is provided. The apparatus includes a support roller for supporting a rotating wafer within a wafer cleaner. The support roller comprises a guide portion, for receiving an edge of a wafer, having an inclined surface comprising a low-friction material and adapted to allow the wafer edge to slide thereagainst; and an edge-trap portion for retaining the edge of the wafer and having a transverse surface comprising a high-friction material and adapted, when in communication with the edge of the wafer, to resist sliding thereagainst. Numerous other aspects are provided.

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