Coating apparatus – Gas or vapor deposition – Work support
Reexamination Certificate
2007-06-26
2007-06-26
Hassanzdeh, Parviz (Department: 1763)
Coating apparatus
Gas or vapor deposition
Work support
C118S724000, C118S500000
Reexamination Certificate
active
10975902
ABSTRACT:
A wafer carrier for growing wafers includes a plate having a first surface and a second surface, a plurality of openings extending from the first surface to the second surface of the plate, and a porous element disposed in each of the plurality of openings, each porous element being adapted to support one or more wafers. The wafer carrier also has a blind central opening extending from the second surface toward the first surface of the plate, and a plurality of shafts extending outwardly from the blind central opening. Each shaft has a first end in communication with the blind central opening and a second end in communication with one of the porous elements for providing fluid communication between the blind central opening and one of the porous elements. Suction is formed at a surface of each porous element by drawing vacuum through the blind central opening and the shafts.
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REMBAR Rhenium Technical Info. Taken from www.rembar.com/Rhenium.htm.
Basics of Design Engineering: Refractory Metals. Taken from www.machinedesign.com.
Boguslavskiy Vadim
Gurary Alex
Stall Richard A.
Hassanzdeh Parviz
Lerner David Littenberg Krumholz & Mentlik LLP
MacArthur Sylvia R.
Veeco Instruments Inc.
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