4. Coating apparatus
  5. Gas or vapor deposition
  6. Multizone chamber

Richard A. Stall

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Apparatus for depositing a coating on a substrate

Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state – With decomposition of a precursor
Patent

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Apparatus for depositing a coating on a substrate

Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent

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Chemical vapor deposition apparatus

Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate

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Gallium nitride semiconductor device

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region
Reexamination Certificate

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Gallium nitride semiconductor device

Active solid-state devices (e.g. – transistors – solid-state diode – Schottky barrier – With means to prevent edge breakdown
Reexamination Certificate

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Profile ID: LFUS-PAI-P-388001

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