Wafer aligning apparatus and related method

Image analysis – Applications – Manufacturing or product inspection

Reexamination Certificate

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Details

C382S218000, C348S087000, C348S095000, C414S936000

Reexamination Certificate

active

07813542

ABSTRACT:
Embodiments of the invention provide a wafer aligning apparatus and a wafer aligning method. In one embodiment, the wafer aligning apparatus comprises an imaging unit adapted to take an image of a wafer being transferred from a load lock chamber to a transfer chamber and adapted to convert the image into digital signals, and a signal processing unit adapted to calculate a center alignment correction value for the wafer by comparing the digital signals to a master image stored in the signal processing unit. The wafer aligning apparatus further comprises a robot controller adapted to receive the center alignment correction value from the signal processing unit and adapted to control a transfer robot in accordance with the center alignment correction value to provide the wafer to a process chamber such that the center of the wafer is substantially aligned.

REFERENCES:
patent: 5524131 (1996-06-01), Uzawa et al.
patent: 5690744 (1997-11-01), Landau
patent: 5696835 (1997-12-01), Hennessey et al.
patent: 5831181 (1998-11-01), Majumdar et al.
patent: 5905850 (1999-05-01), Kaveh
patent: 5917601 (1999-06-01), Shimazaki et al.
patent: 6040585 (2000-03-01), Hsiao
patent: 6546307 (2003-04-01), Hsiao
patent: 2002/0196336 (2002-12-01), Batson et al.
patent: 2003/0167102 (2003-09-01), Johnson et al.
patent: 2004/0258514 (2004-12-01), Raaijmakers
patent: 2005/0140960 (2005-06-01), Hazenberg et al.
patent: 2007/0036535 (2007-02-01), Chee

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