Voltage controller for electrostatic chuck of vacuum plasma proc

Details Voltage controller for electrostatic chuck of vacuum plasma proc Voltage controller for electrostatic chuck of vacuum plasma proc

1996-03-29

1998-01-13

Paschall, Mark H.

Electric heating

Metal heating

By arc

21912154, 21912143, 361234, 156345, 269903, B23K 1000, H02N 1300

Patent

active

057082502

ABSTRACT:
An r.f. excited vacuum plasma processor has a workpiece held in place by a monopolar or bipolar electrostatic chuck having an electrode that develops peak r.f. voltages over a wide amplitude range. A chuck DC power supply source is connected to the chuck. An r.f. peak detecting circuit coupled with the electrode is part of a circuit for controlling the DC voltage applied by the chuck power supply to the chuck. The control circuit supplies an unamplified replica of a DC voltage derived by the peak detecting circuit to the chuck DC power supply source via a DC circuit including only passive elements so the level of the DC voltage applied to the chuck varies in response to variations in the peak amplitude of the r.f. voltage. The peak detector includes at least several series connected diodes having electrodes polarized in the same direction or two stacks of series connected diodes. In one of the stacks, the diode electrodes are polarized in one direction and in the other stack the diode electrodes are polarized in the other direction. The diodes of the peak detecting circuit are arranged so the DC bias voltage supplied to the chuck and the peak value of the r.f. voltage developed at the electrode have the same order of magnitude.

REFERENCES:
patent: 4184188 (1980-01-01), Briglia
patent: 4384918 (1983-05-01), Abe
patent: 4480284 (1984-10-01), Tojo et al.
patent: 4502094 (1985-02-01), Lewin et al.
patent: 4692836 (1987-09-01), Suzuki
patent: 4724510 (1988-02-01), Wicker et al.
patent: 5110438 (1992-05-01), Ohmi et al.
patent: 5557215 (1996-09-01), Saeki et al.
patent: 5605637 (1997-02-01), Shan et al.

Affiliated with

Also associated with

Rating

Voltage controller for electrostatic chuck of vacuum plasma proc does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Voltage controller for electrostatic chuck of vacuum plasma proc, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Voltage controller for electrostatic chuck of vacuum plasma proc will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-328772