Vibration-enhanced spin-on film techniques for semiconductor dev

Details Vibration-enhanced spin-on film techniques for semiconductor dev Vibration-enhanced spin-on film techniques for semiconductor dev

1997-05-06

1999-07-20

Bell, Janyce

Coating processes

Centrifugal force utilized

4273855, 427346, 427422, 427427, 427425, 437231, B05D 312

Patent

active

059254106

ABSTRACT:
A method for forming a layer of material, particularly a dielectric material, on a substrate includes the steps of dispensing the material onto the substrate, spinning the substrate to produce a layer of the dispensed material, and vibrating the substrate to eliminate voids and/or gaps in the dispensed material. The dispensed material is hardened and if not sufficiently planar, may be subjected to a planarization step.

REFERENCES:
patent: 4518678 (1985-05-01), Allen
patent: 4633804 (1987-01-01), Arii
patent: 4668334 (1987-05-01), Doornveld
patent: 5366757 (1994-11-01), Lin
patent: 5480524 (1996-01-01), Oeste
patent: 5512154 (1996-04-01), Rischke et al.

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