Vibration damping in a chemical mechanical polishing system

Details Vibration damping in a chemical mechanical polishing system Vibration damping in a chemical mechanical polishing system

2006-03-21

2006-03-21

Eley, Timothy V. (Department: 3724)

Abrading

Machine

Rotary tool

C451S286000, C451S298000, C451S385000

Reexamination Certificate

active

07014545

ABSTRACT:
A carrier head for chemical mechanical polishing, includes a base, a support structure attached to the base having a surface for contacting a substrate, and a retaining structure attached to the base to prevent the substrate from moving along the surface. The retaining structure and the surface define a cavity for receiving the substrate. The retaining structure includes an upper portion in contact with the base, a lower portion, and a vibration damper separating the upper portion and the lower portion. The vibration damper, the vibration damper includes a material that does not rebound to its original shape when subjected to a deformation.

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