Active solid-state devices (e.g. – transistors – solid-state diode – Including semiconductor material other than silicon or... – Containing germanium – ge
Reexamination Certificate
2005-05-31
2005-05-31
Thomas, Tom (Department: 2815)
Active solid-state devices (e.g., transistors, solid-state diode
Including semiconductor material other than silicon or...
Containing germanium, ge
C257S191000, C257S335000
Reexamination Certificate
active
06900521
ABSTRACT:
Very fast integrated OPL circuits, such as pseudo-NMOS OPL and dynamic OPL, comprising CMOS gate arrays having ultra-thin vertical NMOS transistors are disclosed. The ultra-thin vertical NMOS transistors of the CMOS gate arrays are formed with relaxed silicon germanium (SiGe) body regions with graded germanium content and strained silicon channels.
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Ahn Kie Y.
Forbes Leonard
Diaz José R.
Dickstein , Shapiro, Morin & Oshinsky, LLP
Micro)n Technology, Inc.
Thomas Tom
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