Vertical magnetic recording medium and manufacturing method...

Details Vertical magnetic recording medium and manufacturing method... Vertical magnetic recording medium and manufacturing method...

2005-10-25

2009-12-29

McDonald, Rodney G (Department: 1795)

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

Reexamination Certificate

active

07638020

ABSTRACT:
A magnetic recording medium of higher coercive force and a manufacturing method thereof are provided by enabling reactive sputtering of stable reproducibility even with the addition of oxygen in the formation of a magnetic film using oxygen addition type reactive sputtering. In one embodiment, a vertical magnetic recording medium having SiC and SiOx(x=1 to 2) is provided. Further, a method of manufacturing a vertical magnetic recording medium including the addition of an Ar gas and an oxygen gas to an SiC-containing target in the step of forming a film of a magnetic layer on a soft magnetic under layer by reactive sputtering is provided.

REFERENCES:
patent: 6544893 (2003-04-01), Eto
patent: 2004/0202843 (2004-10-01), Moriwaki et al.
patent: 2005/0255336 (2005-11-01), Mukai
patent: 05-114103 (1993-05-01), None
patent: 2002-342908 (2001-11-01), None

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