Vertical diffusion furnace and cap therefor

Details Vertical diffusion furnace and cap therefor Vertical diffusion furnace and cap therefor

1996-11-22

1998-05-19

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

With treating means

118725, 118715, 432241, 432250, 432205, 432152, C23C 1600, F27B 100, F27B 110

Patent

active

057530467

ABSTRACT:
A vertical diffusion furnace and a cap therefor are provided to minimize diffusion non-uniformity in a diffusion furnace caused by the positioning of a reaction gas outlet. In the vertical diffusion furnace, a reaction gas outlet is formed in the lower portion of a cap and adapted to extend downward through a flange. Thus, is provided a means to maintain diffusion uniformity in the diffusion furnace to comply with the necessity of processing large diameter wafers needed for highly integrated semiconductor devices. Thereby, a decrease in the rate of productivity for operating such equipment due to its positioning of a reaction gas outlet is prevented.

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