Vertical channel transistors and memory devices including...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S328000, C257S392000, C257SE27096

Reexamination Certificate

active

07977736

ABSTRACT:
A semiconductor device is provided which includes an NMOS vertical channel transistor located on a substrate and including a p+ polysilicon gate electrode surrounding a vertical p-channel region, and a PMOS vertical channel transistor located on the substrate and including an n+ polysilicon gate electrode surrounding a vertical n-channel region. The NMOS and PMOS vertical channel transistors are optionally operable in a CMOS operational mode.

REFERENCES:
patent: 4788457 (1988-11-01), Mashiko et al.
patent: 5202855 (1993-04-01), Morton
patent: 5323351 (1994-06-01), Challa
patent: 5864158 (1999-01-01), Liu et al.
patent: 5872374 (1999-02-01), Tang et al.
patent: 5895957 (1999-04-01), Reedy et al.
patent: 6025621 (2000-02-01), Lee et al.
patent: 6198671 (2001-03-01), Aoyama et al.
patent: 6424016 (2002-07-01), Houston
patent: 6531727 (2003-03-01), Forbes et al.
patent: 6538945 (2003-03-01), Takemura et al.
patent: 6549476 (2003-04-01), Pinney
patent: 6734510 (2004-05-01), Forbes et al.
patent: 6861692 (2005-03-01), Kujirai et al.
patent: 2002/0036940 (2002-03-01), Uchikoba et al.
patent: 2005/0017240 (2005-01-01), Fazan
patent: 1383153 (2002-12-01), None
patent: 1020030000962 (2003-01-01), None
patent: 1020040043044 (2004-05-01), None
patent: 1020040075566 (2004-08-01), None
patent: 1020050094576 (2005-09-01), None
Jian Chen et al., .“The Enhancement of Gate-Induced-Drain Leakage (GIDL) Current in Short-Channel . . . ,” IEEE Electron Device Letters, vol. 13, No. 11, Nov. 1992, p. 572-574.
May 28, 2008 Decision of Grant From Korean Patent Application 10-2007-0015470.
Chinese Office Action dated Oct. 24, 2008 with English Translation.
Office Action Dated Feb. 22, 2010 With English Translation.
Office Action date Sep. 18, 2009 corresponding to Chinese Patent Application No. 200710879610.

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