Verification of 3D integrated circuits

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Layout generation

Reexamination Certificate

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C716S100000, C716S106000, C716S110000, C716S119000

Reexamination Certificate

active

08060843

ABSTRACT:
A method of designing a 3D integrated circuit (3D IC) including providing a first layout corresponding to a first device of a 3D IC and a second layout corresponding to a second device of a 3D IC is provided. A verification, such as LVS or DRC, may be performed not only on each device separately, but may also be performed to ensure proper connectivity between devices. The verification may be performed on a single layout file (e.g., GDS II file) including the interface layer of the first and second die. Dummy feature pattern may be determined for the 3D IC using a layout including the interface layers of the first and second devices.

REFERENCES:
patent: 6415421 (2002-07-01), Anderson et al.
patent: 6925614 (2005-08-01), Lu et al.
patent: 2003/0237069 (2003-12-01), Mohan et al.
Chistinel Ababei et al., “Placement and Routing in 3D Integrated Circuits”, 10 pages. Research supported by DARPA under grant N66001-04-1-8909.
Singapore Office Action Dated Jun. 30, 2011; Application No. PIIE080275, 4 pages.

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