Vaporizing apparatus and semiconductor processing system

Details Vaporizing apparatus and semiconductor processing system Vaporizing apparatus and semiconductor processing system

2007-08-24

2009-06-16

Chiesa, Richard L (Department: 1797)

Gas and liquid contact apparatus

Contact devices

Atomizer type

C096S224000, C118S726000, C261S138000, C261S139000, C261S142000, C261SDIG065, C422S121000

Reexamination Certificate

active

07547003

ABSTRACT:
A vaporizing apparatus for generating a process gas from a liquid material includes a vaporizing container defining a vaporizing space of the vaporizing apparatus; an injector connected to the vaporizing container to spray the liquid material in an atomized state into the vaporizing space; and a heater attached to the vaporizing container to heat the liquid material sprayed in the vaporizing space. The vaporizing apparatus further includes a gas delivery passage connected to the vaporizing container to output from the vaporizing space a generation gas generated from the liquid material; a filter disposed inside the gas delivery passage or between the gas delivery passage and the vaporizing space to trap mist contained in the generation gas; and an infrared irradiation mechanism configured to irradiate the filter with infrared rays.

REFERENCES:
patent: 2638644 (1953-05-01), Rauhut
patent: 4060576 (1977-11-01), Grant
patent: 4419302 (1983-12-01), Nishino et al.
patent: 4618462 (1986-10-01), Fisher
patent: 5536323 (1996-07-01), Kirlin et al.
patent: 5589132 (1996-12-01), Zippel
patent: 6789789 (2004-09-01), Randive et al.
patent: 7422198 (2008-09-01), Yoshioka et al.
patent: 7472896 (2009-01-01), Tsai
patent: 2006/0125129 (2006-06-01), Takamatsu et al.
patent: 54-98034 (1979-08-01), None
patent: 2004-211183 (2004-07-01), None

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