Vapor deposition of metal carbide films

Details Vapor deposition of metal carbide films Vapor deposition of metal carbide films

2006-11-01

2009-11-03

Culbert, Roberts (Department: 1792)

Coating processes

Coating by vapor, gas, or smoke

Carbon or carbide coating

C427S569000

Reexamination Certificate

active

07611751

ABSTRACT:
Methods of forming metal carbide thin films are provided. According to preferred embodiments, metal carbide thin films are formed in an atomic layer deposition (ALD) process by alternately and sequentially contacting a substrate in a reaction space with spatially and temporally separated vapor phase pulses of a metal source chemical, a reducing agent and a carbon source chemical. The reducing agent is preferably selected from the group consisting of excited species of hydrogen and silicon-containing compounds.

REFERENCES:
patent: 3708728 (1973-01-01), Sterling et al.
patent: 4058430 (1977-11-01), Suntola et al.
patent: 4085430 (1978-04-01), Gerkema et al.
patent: 4282267 (1981-08-01), Küyel
patent: 4389973 (1983-06-01), Suntola et al.
patent: 4565747 (1986-01-01), Nakae et al.
patent: 4747367 (1988-05-01), Posa
patent: 4761269 (1988-08-01), Conger et al.
patent: 4767494 (1988-08-01), Kobayashi et al.
patent: 4851095 (1989-07-01), Scobey et al.
patent: 4935661 (1990-06-01), Heinecke et al.
patent: 5071670 (1991-12-01), Kelly
patent: 5166092 (1992-11-01), Mochizuki et al.
patent: 5221556 (1993-06-01), Hawkins et al.
patent: 5270247 (1993-12-01), Sakuma et al.
patent: 5281274 (1994-01-01), Yoder
patent: 5306666 (1994-04-01), Izumi
patent: 5316793 (1994-05-01), Wallace et al.
patent: 5342652 (1994-08-01), Foster et al.
patent: 5356673 (1994-10-01), Schmitt et al.
patent: 5438028 (1995-08-01), Weissman et al.
patent: 5443647 (1995-08-01), Aucoin et al.
patent: 5595784 (1997-01-01), Kaim et al.
patent: 5603771 (1997-02-01), Seiberras et al.
patent: 5618395 (1997-04-01), Gartner
patent: 5691235 (1997-11-01), Meikle et al.
patent: 5693139 (1997-12-01), Nishizawa et al.
patent: 5711811 (1998-01-01), Suntola et al.
patent: 5723384 (1998-03-01), Park et al.
patent: 5744254 (1998-04-01), Kampe et al.
patent: 5769950 (1998-06-01), Takasu et al.
patent: 5789024 (1998-08-01), Levy et al.
patent: 5855680 (1999-01-01), Soininen et al.
patent: 5916365 (1999-06-01), Sherman
patent: 5946598 (1999-08-01), Yeh
patent: 5961365 (1999-10-01), Lambert
patent: 5964943 (1999-10-01), Stein et al.
patent: 5965004 (1999-10-01), Cowley et al.
patent: 5972430 (1999-10-01), DiMeo et al.
patent: 5973400 (1999-10-01), Murakami et al.
patent: 6006763 (1999-12-01), Mori et al.
patent: 6015590 (2000-01-01), Suntola et al.
patent: 6087257 (2000-07-01), Park et al.
patent: 6099904 (2000-08-01), Mak et al.
patent: 6104074 (2000-08-01), Chen
patent: 6113977 (2000-09-01), Soininen et al.
patent: 6139700 (2000-10-01), Kang et al.
patent: 6156382 (2000-12-01), Rajagopalan et al.
patent: 6162501 (2000-12-01), Kim
patent: 6188134 (2001-02-01), Stumborg et al.
patent: 6200389 (2001-03-01), Miller et al.
patent: 6200893 (2001-03-01), Sneh
patent: 6203613 (2001-03-01), Gates et al.
patent: 6206967 (2001-03-01), Mak et al.
patent: 6234646 (2001-05-01), Ito
patent: 6270572 (2001-08-01), Kim et al.
patent: 6284646 (2001-09-01), Leem
patent: 6287965 (2001-09-01), Kang et al.
patent: 6342277 (2002-01-01), Sherman
patent: 6355561 (2002-03-01), Sandhu et al.
patent: 6380627 (2002-04-01), Weihs et al.
patent: 6416577 (2002-07-01), Suntoloa et al.
patent: 6475276 (2002-11-01), Elers et al.
patent: 6482262 (2002-11-01), Elers et al.
patent: 6482733 (2002-11-01), Raaijmakers et al.
patent: 6482740 (2002-11-01), Soininen et al.
patent: 6511539 (2003-01-01), Raaijmakers
patent: 6534395 (2003-03-01), Werkhoven et al.
patent: 6576053 (2003-06-01), Kim et al.
patent: 6599572 (2003-07-01), Saanila et al.
patent: 6616982 (2003-09-01), Merrill et al.
patent: 6652924 (2003-11-01), Sherman
patent: 6706115 (2004-03-01), Leskela et al.
patent: 6727169 (2004-04-01), Soininen et al.
patent: 6794287 (2004-09-01), Saanila et al.
patent: 6797340 (2004-09-01), Fang et al.
patent: 6800383 (2004-10-01), Lakhotkin et al.
patent: 6800552 (2004-10-01), Elers et al.
patent: 6809026 (2004-10-01), Yoon et al.
patent: 6821889 (2004-11-01), Elers et al.
patent: 6827978 (2004-12-01), Yoon et al.
patent: 6833161 (2004-12-01), Wang et al.
patent: 6863727 (2005-03-01), Elers
patent: 6902763 (2005-06-01), Elers et al.
patent: 6986914 (2006-01-01), Elers et al.
patent: 7045406 (2006-05-01), Huotari et al.
patent: 7138336 (2006-11-01), Lee et al.
patent: 7211144 (2007-05-01), Lu et al.
patent: 7211508 (2007-05-01), Chung et al.
patent: 7268078 (2007-09-01), Iyer
patent: 7405158 (2008-07-01), Lai et al.
patent: 7416981 (2008-08-01), Lee et al.
patent: 2001/0041250 (2001-11-01), Werkhoven et al.
patent: 2002/0004293 (2002-01-01), Soininen et al.
patent: 2002/0104481 (2002-08-01), Chiang et al.
patent: 2002/0182320 (2002-12-01), Leskela et al.
patent: 2003/0049931 (2003-03-01), Byun et al.
patent: 2003/0082296 (2003-05-01), Elers et al.
patent: 2003/0123216 (2003-07-01), Yoon et al.
patent: 2003/0157760 (2003-08-01), Xi et al.
patent: 2003/0194825 (2003-10-01), Law et al.
patent: 2003/0203616 (2003-10-01), Chung et al.
patent: 2004/0130029 (2004-07-01), Raaijmakers et al.
patent: 2004/0206008 (2004-10-01), Sung
patent: 2004/0208994 (2004-10-01), Harkonen et al.
patent: 2004/0224504 (2004-11-01), Gadgil
patent: 2004/0231799 (2004-11-01), Lee et al.
patent: 2005/0037557 (2005-02-01), Doczy et al.
patent: 2005/0106877 (2005-05-01), Elers et al.
patent: 2006/0019494 (2006-01-01), Cao et al.
patent: 2006/0079090 (2006-04-01), Elers et al.
patent: 2006/0165892 (2006-07-01), Weidman
patent: 2006/0211224 (2006-09-01), Matsuda et al.
patent: 2006/0223300 (2006-10-01), Simka et al.
patent: 2006/0240187 (2006-10-01), Weidman
patent: 2006/0251812 (2006-11-01), Kang et al.
patent: 2007/0148350 (2007-06-01), Rahtu et al.
patent: 2008/0113110 (2008-05-01), Elers et al.
patent: 2008/0182411 (2008-07-01), Elers
patent: 2008/0274617 (2008-11-01), Milligan
patent: 0394054 (1989-04-01), None
patent: 0387403 (1989-10-01), None
patent: 0442490 (1991-08-01), None
patent: 0528779 (1993-02-01), None
patent: 0528779 (1993-02-01), None
patent: 0573033 (1993-06-01), None
patent: 0526779 (1995-10-01), None
patent: 0774533 (1996-10-01), None
patent: 0899779 (1999-03-01), None
patent: 1158070 (2001-11-01), None
patent: 1167567 (2002-01-01), None
patent: 6037041 (1994-02-01), None
patent: 6069157 (1994-03-01), None
patent: 7230957 (1995-08-01), None
patent: 8264530 (1996-10-01), None
patent: 09/087857 (1997-03-01), None
patent: 2001-88044 (2001-12-01), None
patent: 2002-31160 (2002-06-01), None
patent: 2002-87192 (2002-12-01), None
patent: 2003-5727 (2003-01-01), None
patent: 2003-14115 (2003-03-01), None
patent: 2003-14117 (2003-03-01), None
patent: 2003-33234 (2003-05-01), None
patent: 2003-40758 (2003-06-01), None
patent: WO 96/017107 (1996-06-01), None
patent: WO 96/18756 (1996-06-01), None
patent: WO 96/171707 (1996-06-01), None
patent: WO 98/51838 (1998-11-01), None
patent: WO 99/37655 (1999-07-01), None
patent: WO 00/01006 (2000-01-01), None
patent: WO 00/04704 (2000-01-01), None
patent: WO 00/47796 (2000-08-01), None
patent: WO 00/54320 (2000-09-01), None
patent: WO 00/63957 (2000-10-01), None
patent: WO 01/27347 (2001-04-01), None
patent: WO 01/29280 (2001-04-01), None
patent: WO 01/29891 (2001-04-01), None
patent: WO 01/29893 (2001-04-01), None
patent: WO 01/53565 (2001-07-01), None
patent: WO 01/66832 (2001-09-01), None
patent: WO 01/78213 (2001-10-01), None
patent: WO 01/88972 (2001-11-01), None
patent: WO 2004/077515 (2004-09-01), None
patent: WO 2004/077515 (2004-09-01), None
patent: WO 2006/080782 (2006-08-01), None
patent: WO 2008/137399 (2008-11-01), None
International Search Report and Written Opinion dated Apr. 7, 2008, Application No. PCT/US2007/082131.
1988RD-0296076 (Nov. 20, 1998) “Field effect transistor structure with improved transconductance—contg. spacer-less conducting gate oxide, and tungsten deposited on source and drain,” Sep. 19, 2005, East Version 2.0.1.4. Patent-Assignee: Anonymous[ANON].
U.S. Appl. No. 11/743,574, filed May 2, 2007; Office Action mailed Feb. 5, 2009.
U.S. Appl. No. 11/588,837, filed Oct. 27, 2006; Office Action mailed Apr. 2, 2009.
U.S. Appl. No. 11/627,749, filed Nov. 27, 2007; Office Actions mailed May 2, 2007 and Nov. 13, 20

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