Valve closure mechanism for semiconductor deposition apparatus

Details Valve closure mechanism for semiconductor deposition apparatus Valve closure mechanism for semiconductor deposition apparatus

1992-02-03

1994-01-04

Shoap, Allan N.

Receptacles

Closures

With closure opening arrangements for means

220263, 220343, 220344, 49340, 49344, B65D 4326

Patent

active

052753034

ABSTRACT:
This invention provides a closure means for an aperture in a semiconductor deposition furnace, the closure means including an aperture cover plate; at least one articulated linkage including at least two arms, the arms being pivotally mounted with respect to each other to define an angle between them such that variation of the angle causes the plate to move between an aperture closing position and an open position in which the plate is clear of the aperture; and an actuator for driving the articulated linkage and for locking the plate in the aperture closing position. The articulated linkage is in the form of a first arm connected to the cover plate, and a second arm for transferring motive force from the actuator to the first arm. As the plate is moved from its open position to its aperture closing position, the angle between the first and second arms changes from a relatively small angle to a relatively large angle.

REFERENCES:
patent: 1331005 (1920-02-01), Duncan
patent: 2547089 (1951-04-01), Oberst
patent: 2624493 (1953-01-01), Porter
patent: 2835269 (1958-05-01), Seymour
patent: 4429264 (1984-01-01), Richmond
patent: 4561563 (1985-12-01), Woods
patent: 4638597 (1987-01-01), Lybecker
patent: 4735018 (1988-04-01), Duncan et al.
patent: 4785962 (1988-11-01), Toshima

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