Vacuum processing system for producing components

Details Vacuum processing system for producing components Vacuum processing system for producing components

2005-09-13

2005-09-13

Ghyka, Alexander (Department: 2812)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

C438S800000, C414S935000, C414S939000

Reexamination Certificate

active

06943122

ABSTRACT:
The present invention provides a vacuum processing system for creating processed substrates having a domed lid on at least the transfer chamber. The lid may be provided either convex to the chamber, thus decreasing the volume of the chamber and the amount of microparticulate matter present in the chamber, or concave to the chamber. The invention also provides features to enhance the use of the domed lid, e.g., structural features that decrease lifting of the edges of the lid upon introduction of a vacuum to the chamber.

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