Vacuum processing device and film forming device and method usin

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36446828, G06F 1100, G06F 1900

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active

058153969

ABSTRACT:
The present invention relates to vacuum processing equipment for processing a wafer in a vacuum, and film coating or forming equipment and method for forming a film on a wafer wherein radiation measurement and temperature control of the wafer is carried out by using an infrared radiation thermometer. Based upon the radiation measurement, heating and/or cooling of the wafer during processing is carried out.

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R.E. Chupp, "Development and Experimental Evaluation of a Technique to Determine the Temperature Distribution in Semitransparent Solids from Remotely Sensed Spectral Emission Data", Doctoral Dissertation, Purdue University, Aug. 1973.

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