Vacuum processing apparatus

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With workpiece support

Reexamination Certificate

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Details

C156S345310, C118S719000, C118S7230AN, C118S728000, C118S732000, C414S939000

Reexamination Certificate

active

07828928

ABSTRACT:
A vacuum processing apparatus includes an outer chamber comprising a vacuum container, an inner chamber in which a plasma used for processing a wafer is generated, the inner chamber being detachably disposed inside of the outer chamber, a wafer holder on which the wafer is located is disposed inside of the inner chamber, and an exhausting device disposed below the wafer holder which exhausts the inside of the inner chamber. The inner chamber is sealed in air-tight manner with respect to a space between the inner chamber and the outer chamber while the space is maintained at a vacuum pressure.

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patent: 10-214117 (1998-08-01), None
patent: 2003-060005 (2003-02-01), None
patent: 5-053532 (2003-03-01), None

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