Vacuum exhaust system for processing apparatus

Details Vacuum exhaust system for processing apparatus Vacuum exhaust system for processing apparatus

1995-06-29

1996-11-19

Bueker, Richard

Coating apparatus

Condition responsive control

118712, 118715, 118725, C23C 1600

Patent

active

055758533

ABSTRACT:
A main pump having a wide range of vacuum exhaust capabilities and a high exhaust speed is connected adjacent to a processing chamber and an auxiliary pump having a low exhaust speed is connected by a small-diameter auxiliary pipeline to the exhaust side of the main pump. Since a main pump having a wide range of vacuum exhaust capabilities and a high exhaust speed is connected adjacent to the processing chamber in this manner, not only can improvements in the exhaust characteristics be expected, but it is also possible to reduce the diameter of the auxiliary pipeline from the main pump onward and make the auxiliary pump smaller. Since the auxiliary pump having a low exhaust speed is connected by a small-diameter auxiliary pipeline to the exhaust side of the main pump, the size and cost of the entire system can be reduced.

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