Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Patent
1997-03-17
1999-09-21
El-Arini, Zeinab
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
134 2, 134 3, 216 58, 216 66, B08B 312
Patent
active
059548843
ABSTRACT:
A chlorine based dry-cleaning system appropriate for removing metal contaminants from the surface of substrate is described in which the metal contaminant is chlorinated and reduced to a volatile metal chloride by UV irradiation. The process parameters of chlorine gas partial pressure, temperature, ultraviolet bandwidth, and/or the sequence of exposure of the substrate to the chlorine containing gas and to the ultraviolet radiation are selected so as to effect substantial removal of the metal without excessive substrate roughening.
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Chang Jane
Fayfield Robert T.
Lawing Andrew Scott
Sawin Herbert H.
El-Arini Zeinab
FSI International Inc.
Massachusetts Institute of Technology
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