Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
Patent
1996-11-27
1998-07-14
Niebling, John
Semiconductor device manufacturing: process
Formation of semiconductive active region on any substrate
Amorphous semiconductor
438485, H01L 21205
Patent
active
057803552
ABSTRACT:
A method for producing Group III nitride films with high indium content and superior optical quality. The Group III nitride film will produce light in the ultraviolet, blue, green, yellow, and red spectral regions. This will enable fabrication of full-color displays and produce a reliable white light source. A metal organic chemical vapor deposition (MOCVD) process in combination with a photochemical process reduces the growth temperature required to produce optical quality Group III nitride films.
REFERENCES:
patent: 4910044 (1990-03-01), Yamazaki et al.
patent: 5210051 (1993-05-01), Carter et al.
patent: 5585648 (1996-12-01), Tischler
patent: 5633192 (1997-05-01), Moustakas et al.
DenBaars Steven P.
Keller Stacia
Mishra Umesh Kumar
Mulpuri S.
Niebling John
The Regents of the University of California
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